Etchant | Conc. | Conditions | Comments |
---|---|---|---|
Thermal etching in air |
|
Minutes to hours at 100-200°C below the sintering temperature |
AL2O3,
Al2O3-MgO |
Molten Salt
Potassium hydrogen fluoride melt |
|
5-10 minutes in Pt crucible |
Al2O3,
Al2SiO5 |
Distilled water
Phosphoric acid |
15 ml
85 ml |
Boiling for 5 minutes to 2 hours |
Al2O3 |
Distilled water
Sulfuric acid |
50 ml
50 ml |
Boiling for 1-5 minutes | ZrO2 |
Etchant | Conc. | Conditions | Comments |
---|---|---|---|
Molten Salt
Sodium or potassium bicarbonate melt |
| 10 minutes in Pt crucible | SiC |
Hydrochloric acid
Hydrogen peroxide (30%) |
10 ml
10 ml |
Seconds to minutes | WC |
Etchant | Conc. | Conditions | Comments |
---|---|---|---|
Thermal etching in high purity nitrogen |
|
Several hours at 1600° C |
Si3N4 |
Molten Salt
Potassium hydroxide melt |
|
Seconds to minutes in Pt crucible |
>Si3N4
|
Hydrofluoric acid |
100% |
10-15 minutes | Si3N4 |
Etchant | Conc. | Conditions | Comments |
---|---|---|---|
Latic acid
Nitric acid Hydrofluoric acid |
30 ml
10 ml 10 ml |
Seconds to minutes | ZrB2 ,TiB2 |