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ZrO2 particles in Titanium Matrix (MMC) Specimen Preparation

Hard particles in a metal matrix can be difficult to microstructurally prepare because of particle pull-out as well as excessive relief between the particles and the matrix. The key to preparation of metal matrix composites is to minimize damage at each preparation stage. This includes sectioning with the appropriate diamond wafering blade and using the finest practical abrasive for initial grinding. Polishing with SIAMAT colloidal silica provides a chemical mechanical polishing (CMP) action which is the most effective means for eliminating both surface and subsurface damage. The combination of SIAMAT colloidal silica with DIAMAT polycrystalline diamond also produces the required surfaces finishes in a minimal amount of time.

SECTIONING

Diamond Wafering blade - medium grit / high concentration

MOUNTING
Castable Mounting with Epoxy or Acrylic resins

POLISHING

Abrasive/surface

Lubricant

Force/ sample

Speed
(Head/base)

Time

30 um DIAMAT diamond suspension on CERMESH Metal Mesh cloth   5-10 lbs

200/200 rpm

Until plane
9 um DIAMAT diamond on POLYPAD polishing pad   5-10 lbs

200/200 rpm

3 minutes
3 um DIAMAT diamond on TEXPAN polishing pad SIAMAT colloidal silica 5-10 lbs

200/200 rpm

3 minutes

0.05 micron NANOMETER alumina on TRICOTE polishing pad

 

5-10 lbs

100/100 rpm

1 minute



Metallographic micrograph of ZrO2 in a titanium matrix

Zirconium Diboride particles in a Titanium Matrix
As polished, 400X (DIC)

Metallographic micrograph of ZrO2 in a titanium matrix

Zirconium Diboride particles in a Titanium Matrix
Etched, 1000X (DIC)

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